[操作手冊] 負染色(Negative Staining)
可使用Nano-W染劑 (2 % Methylamine Tungstate)或2%醋酸鈾 (Uranyl Acetate, UA)
1. 在銅網上滴4 μL樣品反應1 分鐘後，用濾紙吸掉多餘樣品 (銅網可先經過親水性處理)
2. 用 ddH_2O清洗一次 (清洗次數可以調整)
3. 滴上4 μL 的2 %Nano-W或2 % 醋酸鈾染劑反應1分鐘 (培養時間可視樣品濃度作調整)，使用UA染色過程需注意避光
4. 用濾紙吸掉多餘的染劑
5. 染色完後可照光6分鐘加速乾燥，最後存放至防潮箱乾燥一晚，隔天可TEM上機
Use Nano-W stain (2 % Methylamine Tungstate) or 2% uranyl acetate (UA)
1. Loaded 4 μL sample solution onto carbon film for 1 min, and removed the excess
solution was by filter paper
2. Washing one time with ddH_2O
3. Sample was stained with 4 μL 2 % Nano-W or 2 % uranyl acetate (UA) for 1 min
(incubate time depends on sample concentration). Because UA is a light-sensitive stain,
prevent the UA solution from light (especially UV light)
4. The residual stain solution was removed by filter paper
5. Stored in humidity control box and dry overnight
1. 在銅網上滴4 μL樣品反應1 分鐘後，用濾紙吸掉多餘樣品 (銅網可先經過親水性處理)
2. 用 ddH_2O清洗一次 (清洗次數可以調整)
3. 滴上4 μL 的2 %Nano-W或2 % 醋酸鈾染劑反應1分鐘 (培養時間可視樣品濃度作調整)，使用UA染色過程需注意避光
4. 用濾紙吸掉多餘的染劑
5. 染色完後可照光6分鐘加速乾燥，最後存放至防潮箱乾燥一晚，隔天可TEM上機
Use Nano-W stain (2 % Methylamine Tungstate) or 2% uranyl acetate (UA)
1. Loaded 4 μL sample solution onto carbon film for 1 min, and removed the excess
solution was by filter paper
2. Washing one time with ddH_2O
3. Sample was stained with 4 μL 2 % Nano-W or 2 % uranyl acetate (UA) for 1 min
(incubate time depends on sample concentration). Because UA is a light-sensitive stain,
prevent the UA solution from light (especially UV light)
4. The residual stain solution was removed by filter paper
5. Stored in humidity control box and dry overnight
Negative Staining Protocol (中英文版).pdf