1. 可使用Nano-W染劑 (2 % Methylamine Tungstate)或2%醋酸鈾 (Uranyl Acetate, UA)

2. 在銅網上滴4 μL樣品反應1 分鐘後，用濾紙吸掉多餘樣品 (銅網可先經過親水性處理)

3. 用 ddH_2O清洗一次 (清洗次數可以調整)

4. 滴上4 μL 的2 %Nano-W或2 % 醋酸鈾染劑反應1分鐘 (培養時間可視樣品濃度作調整)，使用UA染色過程需注意避光

5. 用濾紙吸掉多餘的染劑

6. 染色完後可照光6分鐘加速乾燥，最後存放至防潮箱乾燥一晚，隔天可TEM上機

1. Use Nano-W stain (2 % Methylamine Tungstate) or 2% uranyl acetate (UA)

2. Loaded 4 μL sample solution onto carbon film for 1 min, and removed the excess solution was by filter paper

3. Washing one time with ddH_2O

4. Sample was stained with 4 μL 2 % Nano-W or 2 % uranyl acetate (UA) for 1 min (incubate time depends on sample concentration).

   Because UA is a light-sensitive stain, prevent the UA solution from light (especially UV light)

5. The residual stain solution was removed by filter paper

6. Stored in humidity control box and dry overnight